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Chemical Name


trifluoroacetylglycine (C4H4F3NO3)

Compound Descriptions:

Structure Drawing
Formula:C4H4F3NO3
Molecular Weight:171.075 g/mol
Name(s):trifluoroacetylglycine
N-(trifluoroacetyl)glycine
glycine, N-(trifluoroacetyl)-
Trifluoroacetyl-glycine
N-(Trifluoroacetyl) aminoacetic acid
CAS-RN:383-70-0
Classification:no charge; carboxylic acid; amide; 1fragment

Landolt-Börnstein Citations:

Thermodynamic Properties

 Vapor Pressure of Chemicals: Vol. IV/20a 4.3:751IV/20A
 Vapor Pressure of Chemicals: Vol. IV/20b 2.2:465IV/20B
 Vapor Pressure of Chemicals: Vol. IV/20c 2.3:445IV/20C

References

IV/20A
Short: IV/20A
Title: Vapor Pressure and Antoine Coefficients for Hydrocarbons and Sulfur-, Selenium-, Tellurium-, and Halogen-Containing Organic Compounds
Author: Dykyj, J.; Svoboda, J.; Wilhoit, R.C.; Frenkel, M.; Hall, K.R.
Editor: Hall, K.R.
Source: Landolt-Börnstein, New Series
Volume: IV/20A
Year: 1999
Keyword: organic compounds; vapor pressure
ISBN: 3-540-64735-X
ISBN: 978-3-540-64735-5
Internet Resource: DOI:10.1007/b71086
RefComment: VIII, 373 pages.
IV/20B
Short: IV/20B
Title: Vapor Pressure and Antoine Coefficients for Oxygen Containing Organic Compounds
Author: Dykyj, J.; Svoboda, J.; Wilhoit, R.C.; Frenkel, M.; Hall, K.R.
Editor: Hall, K.R.
Source: Landolt-Börnstein, New Series
Volume: IV/20B
Year: 2000
Keyword: organic compounds; vapor pressure
ISBN: 3-540-64968-9
ISBN: 978-3-540-64968-7
Internet Resource: DOI:10.1007/b71424
RefComment: VII, 320 pages.
IV/20C
Short: IV/20C
Title: Vapor Pressure and Antoine Coefficients for Nitrogen Containing Organic Compounds
Author: Dykyj, J.; Svoboda, J.; Wilhoit, R.C.; Frenkel, M.; Hall, K.R.
Editor: Hall, K.R.
Source: Landolt-Börnstein, New Series
Volume: IV/20C
Year: 2001
Keyword: organic compounds; vapor pressure
ISBN: 3-540-41060-0
ISBN: 978-3-540-41060-7
Internet Resource: DOI:10.1007/b88812
RefComment: VII, 197 pages

  File created on 2009/18/08 by LCI Publisher GmbH (Gaja Peters, Inga Thede, Volkmar Vill, Ron Zenczykowski)
  © 2009   Landolt Börnstein,   Springer-Verlag Berlin Heidelberg